Editing Seams with PTStitcherNG
Prof. Dr. H. Dersch - HFU Furtwangen
Apply Seam Mask
Mask images are applied to the stitching process using the -e option:
PTStitcherNG -e mask.tif -o pano project.pts
We use the original unaltered project file project.pts and create
a panoramic image named pano with this command. This is the
result with the hidden camera bracket:
Some final notes:
- The stitching mask may be saved and reused for other projects or for
repeated stitching, e.g. if project parameters are changed.
- The stitching mask must be saved in a lossless format. One of the
compressed TIFF-variants is ideal and allows the user to save all relevant seam
information in a few kilobytes to repeat the stitching process at any time.
- The stitching mask must be the same size as the panoramic image.
If a stitching mask is scaled to be reused for differently sized
panoramas, then the scaling process must preserve the colors (no interpolation).
- Seam editing currently (PTStitcherNG version 0.7) does not work
with option -b 1 (optimized seam positioner)
and options -z or -n (blend over zenith/nadir).
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Copyright H. Dersch 2010